ASML China: The Existing Technology Is More Than Enough To Handle 1nm Chips

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May 16 is the "international day of light" defined by UNESCO. ASML Chinese official posted wechat push "Innovation makes Moore's law glow again," it wrote. ASML China stressed that Moore's law has still been in force and in good condition in the past 15 years, and will continue to maintain its momentum in the next decade or more.

ASML confidently pointed out that " in terms of components, the current technological innovation is enough to promote the chip manufacturing process to at least 1 nm nodes, including gate all around FETs, nanosheet FETs, forksheet FETs and comprehensive FETs"**

In addition, the improvement of lithography system resolution (expected to be reduced by twice every 6 years) and the measurement of accuracy by edge placement error (EPE) will further promote the realization of chip size reduction.

It is understood that nano technology will enter the Amy era. TSMC and Intel have formulated an ambitious early roadmap for the Amy process. Perhaps, the reason why technological innovation is precious is that it will not be knocked down by difficulties.

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